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The MicroLine® series of non-contact critical dimensional measurement systems are ideal for semiconductor and MEMS applications.
MicroLine critical dimension measurement systems are designed specifically for semiconductor and MEMs wafer and photomask CD metrology. MicroLine
systems automatically measure linewidth, overlay registration, and other critical features.
MicroLine Systems are equipped with the highest quality microscope optics and precision motion stages, providing capability to measure features from
0.5 µm to 400 µm in size. Typical measurement accuracy and repeatability is 10 nm at 1 σ (with 100x objective).
The MicroLine is offered in two configurations:
- MicroLine 300: benchtop manual X,Y stage critical dimension measurement system
- New MicroLine 400: benchtop critical dimension measurement system with motorized X,Y stage
ML-300
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ML-400
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NEW!!
MicroLine 400
The MicroLine 400 combines the convenience and value of the benchtop ML-300 with the added automation of a precision motorized stage by Ludl.
The new ML-400 combines full feature microscope measurements at up to 100X with the option of transmitted illumination and an automated stage.
The ML-400 is an ideal system for photomask qualification and critical dimension verification, or for low to mid volume wafer inspection.
The standard ML-400 supports wafers up to 200mm in diameter, while the optional configuration supports 300mm wafers.
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